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Fundamental Electron Interactions with Plasma Processing Gases (Softcover Reprint of the Original 1st 2004)

Fundamental Electron Interactions with Plasma Processing Gases

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"Fundamental Electron Interactions with Plasma Processing Gases" by Loucas G. Christophorou, James K. Olthoff is a astronomy book and space science reference focused on Cosmology. Best for students, researchers, and serious astronomy enthusiasts.

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

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Best For: Researchers and professionals in semiconductor technology and plasma processing
Focus: Fundamental interactions of low-energy electrons with molecules relevant to plasma processing gases
Covers: Elastic and inelastic electron scattering and electron-impact processes with molecules used in modern technology
Why It Matters: Understanding these electron-molecule interactions is essential for advancements in semiconductor manufacturing and related plasma technologies

"Fundamental Electron Interactions with Plasma Processing Gases" by Loucas G. Christophorou, James K. Olthoff is a astronomy book and space science reference focused on Cosmology. Best for students, researchers, and serious astronomy enthusiasts.

Topic: Cosmology

Author: Loucas G. Christophorou, James K. Olthoff

Who this is for:

  • Astronomy students
  • Researchers and advanced hobbyists
  • Readers exploring space science topics

Why this book matters: It matters because it helps readers build a stronger understanding of astronomy concepts, observations, and scientific ideas related to space.

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

AuthorLoucas G. Christophorou, James K. Olthoff
PublisherSpringer
Published2012-09-21
ISBN-139781461347415
BindingPaperback
LanguageEnglish
SubjectsScience
TopicCosmology
SeriesPhysics of Atoms and Molecules

Format: Paperback

Language: English

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