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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Softcover Reprint of the Original 1st 2018)

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

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"Physical Design and Mask Synthesis for Directed Self-Assembly Lithography" by Seongbo Shim, Youngsoo Shin is a physics book focused on Devices & Sensors. Best for students, educators, and scientifically curious readers.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

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Best For: Researchers and engineers working on sub-7nm semiconductor technology and lithography techniques.
Focus: Physical design optimizations and mask synthesis methods specific to directed self-assembly lithography.
Covers: Basic DSAL technology background, placement optimization, redundant via insertion, mask synthesis, and verification processes.
Why It Matters: Provides detailed methods for improving patterning solutions critical to advancing semiconductor manufacturing at sub-7nm scales.

"Physical Design and Mask Synthesis for Directed Self-Assembly Lithography" by Seongbo Shim, Youngsoo Shin is a physics book focused on Devices & Sensors. Best for students, educators, and scientifically curious readers.

Topic: Devices & Sensors

Author: Seongbo Shim, Youngsoo Shin

Who this is for:

  • Physics students
  • Science-minded readers
  • Readers building technical understanding

Why this book matters: It provides structured coverage of physics concepts in a way that supports deeper understanding and continued study.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

AuthorSeongbo Shim, Youngsoo Shin
PublisherSpringer
Published2019-02-08
ISBN-139783030094553
BindingPaperback
Pages138
LanguageEnglish
SubjectsTechnology & Engineering
TopicDevices & Sensors
SeriesNanoscience and Technology

Format: Paperback

Length: 138 pages

Language: English

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