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Microscopy of Semiconducting Materials 1987, Proceedings of the Institute of Physics Conference, Oxford University, April 1987

Microscopy of Semiconducting Materials 1987, Proceedings of the Institute of Physics Conference, Oxford University, April 1987

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"Microscopy of Semiconducting Materials 1987, Proceedings of the Institute of Physics Conference, Oxford University, April 1987" by Cullis is a physics book focused on Devices & Sensors. Best for students, educators, and scientifically curious readers.

Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques.

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Best For: Researchers and professionals in semiconductor microscopy and materials science
Focus: Advances in electron probe microscopy and related imaging techniques for semiconducting materials
Covers: High resolution microscopy, epitaxial layers, quantum wells, superlattices, bulk compounds, dislocations, device silicon, dielectric structures, silicides, contacts, device testing, x-ray techniques, microanalysis, and scanning microscopy
Why It Matters: Provides detailed insights into state-of-the-art microscopy methods essential for understanding and developing semiconductor materials and devices

"Microscopy of Semiconducting Materials 1987, Proceedings of the Institute of Physics Conference, Oxford University, April 1987" by Cullis is a physics book focused on Devices & Sensors. Best for students, educators, and scientifically curious readers.

Topic: Devices & Sensors

Author: Cullis

Who this is for:

  • Physics students
  • Science-minded readers
  • Readers building technical understanding

Why this book matters: It provides structured coverage of physics concepts in a way that supports deeper understanding and continued study.

Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques.

AuthorCullis
PublisherCRC Press
Published1987-10-01
ISBN-139780854981786
BindingHardcover
Pages836
LanguageEnglish
SubjectsTechnology & Engineering
TopicDevices & Sensors
SeriesInstitute of Physics Conference

Format: Hardcover

Length: 836 pages

Language: English

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