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Glow Discharge Processes: Sputtering and Plasma Etching

Glow Discharge Processes

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"Glow Discharge Processes" by Brian Chapman is a physics book focused on Devices & Sensors. Best for students, educators, and scientifically curious readers.

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

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Best For: Students and professionals in physics and electrical engineering focusing on plasma processes.
Focus: Detailed understanding of material deposition and etching using sputtering and chemically active glow discharges.
Covers: Fundamental phenomena of glow discharge, voltage distributions in plasma etching systems, plasma-electron interactions, and industrial applications of sputtering and plasma etching.
Why It Matters: Provides a thorough connection between basic plasma physics and practical techniques used in material processing industries.

"Glow Discharge Processes" by Brian Chapman is a physics book focused on Devices & Sensors. Best for students, educators, and scientifically curious readers.

Topic: Devices & Sensors

Author: Brian Chapman

Who this is for:

  • Physics students
  • Science-minded readers
  • Readers building technical understanding

Why this book matters: It provides structured coverage of physics concepts in a way that supports deeper understanding and continued study.

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

AuthorBrian Chapman
PublisherWiley-Interscience
Published1980
ISBN-139780471078289
BindingHardcover
Pages432
LanguageEnglish
SubjectsScience
TopicDevices & Sensors

Format: Hardcover

Length: 432 pages

Language: English

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